TSMC Strengthens Its Advanced Process with Next-Generation EUV Equipment Reportedly Arriving This Month (TRENDFORCE, Sep10th 2024)
TSMC’s first high numerical aperture extreme ultraviolet lithography (High-NA EUV) equipment will arrive this month.
Regarding these rumors, #ASML stated on September 9 that it does not comment on individual customers. #TSMC has also declined to respond to market speculation.
The report has cited industry rumors, pointing out that TSMC’s first #HighNA #EUV machine is expected to be moved to its Global #R&D Center for research purposes, addressing the development needs of future advanced processes like #A14.
The High-NA EUV is priced at over EUR 400 million. Due to the inability to disassemble the optical lens components, the equipment is bigger the Double-decker.