TECHCET ALD/CVD High-k & Metal Precursors CMR? – Just Released!

The TECHCET ALD/CVD High-k & Metal Precursors Critical Materials Report? provides information on the applications, IP-filing and markets associated with front end and back end of line precursors used to produce high-k dielectrics, metals, meatl oxides and nitrides by atomic layer deposition (ALD) and chemical vapor depsotion (CVD) metal oxides and nitrides. The report is written by Jonas Sundqvist and edited by Lita Shon-Roy.

Full table of contents : LINK

TECHCET Reports can be Included with CMC Membership – Click Here for Info!

TECHCET Critical Material Reports?

• ALD / CVD Precursors
• CMC Associate Membership
• CMP Consumables
• Consumable Equipment Components
• Device Trends and Material Requirements
• Gases (Specialty, NEON)
• Metal Deposition Materials (Targets, ECP/ELP, etc.)
• Photoresist and Ancillaries
• Silicon Wafers
• Wet Chemicals