Tech News: ASML to Unveil 2nm Equipment; Intel Snags 6 High-NA EUV Machines

In a recent report, ASML is set to launch its highly anticipated 2nm process equipment in the coming months, with plans to produce 10 units by 2024. Notably, 英特尔 has taken the lead by securing orders for six of these advanced machines.

ASML's next-generation High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) lithography machines boast an enhanced numerical aperture, increasing from 0.33 to 0.55. This upgrade enables finer exposure patterns crucial for the 2nm process node. Over the next few years, ASML aims to ramp up production capacity for these cutting-edge devices to 20 units annually.

Intel has already initiated large-scale production utilizing EUV lithography machines at its $18.5 billion facility in Ireland. This marks Intel's inaugural foray into high-volume manufacturing with EUV technology, as the company endeavors to reclaim a leading position through innovative manufacturing techniques.

Apart from Intel, Samsung Semiconductor has also committed to procuring ASML's 2nm process wafer manufacturing equipment. Samsung aims to commence 2nm chip production by the end of 2025. In a significant collaboration, both companies have signed a trillion-won agreement (approximately $7.55 billion) to invest in constructing a semiconductor chip research facility in South Korea. This joint venture will focus on developing next-generation EUV semiconductor manufacturing technologies.

According to the outlined schedule, Intel is set to commence volume production of the Intel 20A process in the first half of 2024, followed by the more advanced Intel 18A process in the second half of the same year. 台积公司 and Samsung are also gearing up for the mass production of 2nm processes in 2025, with ASML's latest High-NA EUV lithography machine playing a pivotal role in this endeavor.

Recent updates reveal that ASML is currently in the developmental phase of a 0.55 NA High-NA EUV lithography machine with an impressive 8nm resolution. This cutting-edge technology will assist chip manufacturers in producing chips for 2nm and below, offering lower graphic exposure costs and increased production efficiency. KeyBanc, a reputable research institution, anticipates the cost of a 0.55 NA EUV lithography system to be approximately $318.6 million, in contrast to the $153.4 million for the currently shipping 0.33 NA EUV lithography system, as stated previously.

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Relevant Resource:?? Intel Secures 6 High-NA EUV Lithography Machines??