Metallography of Microelectronic Components
ICs, silicon wafers, and PCBs are key building blocks in modern electronic devices, and metallography plays an important role in the design, development, and failure analysis of these electronic components.
However, ICs, silicon wafers, and PCBs can be challenging to prepare for metallographic analysis. ICs are tiny, with complex geometries, and often include several different materials, such as metal, glass, or ceramics. This makes controlled material removal time-consuming, requiring patience and skill to grind and polish to a specific target inside a component.
MICROELECTRONIC SAMPLE PREPARATION CHALLENGES
There are three main challenges when performing controlled material removal and target preparation of microelectronic samples.
Read more about the challenges of the metallographic preparation here:
In research or failure analysis, missing the target during a grind-and-look process can mean losing a unique and/or costly sample. Therefore, automated or optimized solutions are increasingly used due to their high mechanical precision, optical measuring units, and mechanical stops.
Common difficulties during the preparation of microelectronic samples include:
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There are special tools (AccuStop) that simplify the manual and semi-automatic controlled material removal process. For fully automatic target preparation, the Struers TargetSystem offers fast and precise grinding and polishing.
To avoid relief between hard and soft layers and materials, we recommend grinding with diamond on rigid discs and diamond polishing on hard cloths.
For more information, visit our website about microelectronics at https://www.struers.com/en/Knowledge/Materials/Microelectronics
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