Membrane Solutions Photoresist Filtration: The Guardian of Semiconductor Manufacturing
In the intricate realm of semiconductor manufacturing, photoresist as a pivotal material, exquisitely sensitive to specific wavelengths of light. Composed of resin, sensitizer, solvent, and additives, photoresist plays a crucial role in photolithography. The patterns etched on photomasks are meticulously projected onto this photosensitive material. Through a series of photochemical reactions, followed by baking and developing, these patterns are precisely transferred, forming a protective resist layer that is essential for subsequent etching and ion implantation processes.
?Photoresist can be categorized into two primary types based on the principles of the photolithographic process:
?Positive Photoresist: This type of photoresist primarily undergoes degradation reactions when exposed to energy beams, such as light, electron, or ion beams. During exposure, the polymer chains break down, becoming shorter and more soluble in the developer. Consequently, the exposed areas dissolve in the developer, resulting in patterns that directly correspond to those on the photomask.
?
?Negative Photoresist: In contrast, negative photoresist primarily undergoes crosslinking reactions upon exposure. The polymer chains interlink, making the material more resistant to the developer. Consequently, the unexposed areas are dissolved, resulting in patterns that are the inverse of those on the photomask.
?
As a fundamental material in semiconductor manufacturing, the performance of photoresist directly correlates with the quality and production efficiency of the final product. While most photoresists are engineered for exceptional uniformity, thermal stability, and environmental resilience, they remain susceptible to physicochemical changes and contamination during storage and use.
?
Negative photoresist is particularly susceptible to gel-like agglomerations, which can form around inorganic catalyst nucleation cores or as a result of incomplete polymer dissolution in the solvent medium. Positive photoresist, although less prone to gel formation, can still degrade due to sensitizer decomposition and precipitation, especially when exposed to incompatible solvents. In highly demanding applications, positive photoresist may only maintain its integrity for 1 to 2 months. Beyond this period, filtration and reconfirmation of its microcomponent purity are essential before reintegrating it into silicon wafer manufacturing processes.
领英推荐
?
The performance of photoresist is intrinsically linked to the dimensional accuracy and reliability of semiconductor devices. Optimizing photoresist composition through filtration to minimize photolithographic defects is essential for advancing semiconductor technology.
Our photoresist filtration?solutions are characterized by:
?
?
For different types and application scenarios of photoresist, we offer four types of filtration membranes: UPE（Ultra-high molecular Weight Polyethylene）, Nylon, PTFE, and PP. The Capsule Filter of the EPC, EHC, and PhotoPure-PR?series are connected through dedicated piping support, allowing for easy disassembly and replacement. The Wet-Fluoride Series features a perfluorinated structural design that offers excellent chemical resistance, satisfying high cleanliness requirements while also boasting high flow rates and long service life. The high-efficiency UPE pleated filter from the Photo-Unix series offers precision options ranging from 2 nm to 1.0μm. Its larger filtration area optimizes both flow rate and service life.?The Photo-Novel ?series is specifically designed for photoresist filtration. The hydrophilic Nylon membrane ensures rapid wetting, significantly reducing the waste of material solution during the process, bubbles generated during filtration, and resulting equipment downtime.
?View more products for Photoresist Filtration：?