MEDICAL DEVICE PROGRAMS

TECHNOLOGY ENGINEERING CORPORATION

3603 Edgar D Nixon Ave. Montgomery, Alabama 36105

Phone: (386) 314-2676??? E-Mail: [email protected]

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"A few of our customers and strategic partners have included"

DOD, DOE, NIST, NSF, NASA, GENERAL MOTORS, FORD MOTOR CO., CHRYSLER, BRISTOL- MYERS SQUIBB, CONMED LINVATEC, JOHNSON & JOHNSON, UTC, GE, P&W, NORTHROP GRUMMAN, SIEMENS, HONEYWELL, RAYTHEON, MOTOROLA, CERADYNE, 3M, OAKRIDGE NATIONAL LABS, LAWRENCE LIVERMORE NATIONAL LABS, FRAUNHOFER INSITUTES, UES, NORTON ADVANCED CERAMICS AND DIAMOND FILM GROUP, SAINT-GOBAIN, CERAMTEC, ZIMMER/BIOMET, MEDTRONIC, STRYKER, BOSTON SCIENTFIC, BAYER, AND EXACTECH.

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*PVD (Physical Vapor Deposition) Medical Device or substrates are heated in a vacuum chamber at low temperatures approximately 900°F (500°C). A vaporized or ionized compound is then deposited on the parts by ion plating, magnetron sputtering, or arc evaporation.

* CVD (Chemical Vapor Deposition) CVD is a generic name for a group of processes. Precursor gases (often diluted in carrier gases) are delivered into the reaction chamber at approximately ambient temperatures. As they pass over or come into contact with a heated substrate, they react or decompose forming a solid phase which and are deposited onto the substrate. The substrate temperature is critical and can influence what reactions will take place.

* PECVD (Plasma Enhanced Chemical Vapor Deposition), the substrate is placed inside a reactor to which a number of gases are supplied. The fundamental principle of the process is that a chemical reaction takes place between the source gases. The product of that reaction is a solid material with condenses on all surfaces inside the chamber.

*?(ALD) (Atomic Layer Deposition) is a thin-film deposition?technique based on the sequential use of a gas phase chemical process; it is a subclass of chemical vapor deposition. ... Through the repeated exposure to separate precursors, a thin film is slowly deposited.

* ALCVD (Atomic Layer Chemical Vapor Deposition) – Deposits successive layers of different substances to produce layered, crystalline films, a more precise and conformal coating technology.

* Microwave Assisted Deposition, Microwave assisted deposition is used as a rapid deposition and is also used in Diamond Thin Film Processes. Microwave assisted depositions are used in various technologies and for various reasons, only microwave assisted diamond deposition plasma reactors can achieve the optimal growth conditions for the efficient generation of the precursor species to diamond growth, monocrystalline diamond substrate orientation and quality on the growth of the epitaxial layer.

*Sputtering and Magnetron Sputtering, a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. Physical sputtering is driven by magnetron, vacuum tube oscillator that generates high-power electromagnetic signals in the microwave frequency range, omentum exchange between the ions and atoms in the materials, due to collisions.

* High-Power Impulse Magnetron Sputtering (HiPIMS), utilizes extremely high power densities in short impulses of microseconds at low cycle on/off time ratio. A distinguishing feature of HiPIMS is its high degree of ionisation of sputtered metal and high rate of molecular gas dissociation.

* Electron Beam, This produces the enhanced energy deposition in the target. Enhanced energy deposition by high-current electron beams in dense fusion targets.

*Ion Beam Enhanced Deposition (IBED) is a physical, non-equilibrium coating process implemented by the simultaneous bombardment of a growing film with an independently controllable beam of energetic atomic particles

* Ion Assisted Deposition (IAD), the substrate is exposed to a secondary ion beam operating at a lower power than the sputter gun. Usually a Kaufman source like that used in IBS supplies the secondary beam.

* Laser Deposition, Pulsed laser deposition (PLD) is a deposition process using high power pulsed laser to ablate material for a target which is then deposited onto a substrate or Medical Device. Laser medicine consists in the use of lasers in medical diagnosis, treatments, or therapies, such as laser photodynamic therapy.

*ARC Deposition, Cathodic arc deposition or Arc-PVD is a physical vapor deposition technique in which an electric arc is used to vaporize material from a cathode target. The vaporized material then condenses on a substrate, forming a thin film.

* Filtered ARC Deposition (Micro-Particle Free) filtered arc source allows deposition of droplet-free coatings by deflecting the plasma flow along the curvilinear magnetic lines of force towards the substrate

* Nanotechnology, Crystal Growth Deposition, Nanotechnology operates on an atomic or molecular scale, allowing new materials and coatings. Common uses of pharmaceutical coatings consist of protecting the drug and drug delivery systems.

*Wet Technologies (Colloidal Deposition, Sol-gels, Plating), colloidal deposition is spontaneous particles attached to surfaces in a dipping type process, sol-gel process is a wet-chemical technique widely used in the fields of materials science and ceramic engineering. Plating is the electrode position of a metal or alloy from a suitable electrolyte solution

*Plasma and Thermal Spray, Thermal spraying techniques are coating processes in which melted (or heated) materials are sprayed onto a surface. The Plasma Spray Process is basically the spraying of molten or heat softened material onto a surface to provide a coating. Material in the form of powder is injected into a very high temperature plasma flame, where it is rapidly heated and accelerated to a high velocity. The hot material impacts on the substrate surface and rapidly cools forming a coating.

*Plasma Technologies, energy is supplied to a gas, it is ionized and goes into the energy-rich plasma state. Plasma, described as the fourth state of matter, comprises charged species, active molecules and atoms and is also a source of UV-photons. These plasma-generated active species are useful for several bio-medical applications such as sterilization of implants and surgical instruments as well as modifying biomaterial surface properties. Sensitive applications of plasma, like subjecting human body or internal organs to plasma treatment for medical purposes, are also possible.

* Plasma Medicine is an innovative and emerging field combining plasma physics, life sciences and clinical medicine to use physical plasma for therapeutic applications. Initial experiments confirm that plasma can be effective in vivo antiseptics without affecting surrounding tissue and, moreover, stimulating tissue regeneration. Based on sophisticated basic research on plasma-tissue interaction, first therapeutic applications in wound healing, dermatology and dentistry will be opened.

* Ultraviolet and Pulsed Ultraviolet Irradiation Technologies, UV, UVC, UVB, UVA, UVGI, including Photohydration, Photosplitting, Photodimerization, and Photo Crosslinking.

UVC is highly antimicrobial and can be directly applied to acute wound infections to kill pathogens without unacceptable damage to host tissue. UVC is already widely applied for sterilization of inanimate objects. UVB (280–315?nm) has been directly applied to the wounded tissue to stimulate wound healing, and has been widely used as extracorporeal UV radiation of blood to stimulate the immune system. Penetration of UV light into tissue is limited and optical technology may be employed to extend this limit. New high-technology UV sources, such as light-emitting diodes, lasers, and microwave-generated UV plasma are becoming available for biomedical applications.

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?????????SURFACE ENGINEERING MODIFACTIONS & TREATMENTS

?????????? Biocompatible and FDA Compliant Coatings

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Graphene/Graphene Oxide?????????????????????????????????????????????????? Boron Nitrides

Silicon Nitrides???????????????????????????????????????????????????????????????????????? Titanium Boron Nitrides, TiB2

Silicon Oxides??????????????????????????????????????????????? ??????????????????????????? Cubic Boron Nitride

Zirconium Oxides???????????????????????????????????????????????????????????????????? Hafnium Boron Nitrides

Zirconium Nitrides?????????????????????????????????????????????????????????????????? Chromium Modified Oxide

Titanium and Tungsten Porous Coatings???????????????????????????? Aluminum Oxides & Titanium Oxides

Titanium Nitride, Titanium Dioxides?????? ?????????????????????????????? Pyrolytic Carbon, Pyrocarbons

Titanium Carbon Nitride????? ??????????????????????????????????????????????????? DLC, Amorphous DLC, Doped DLC????????????????????????????????????????????????????????????? ???????????????????

Titanium Aluminum Nitride?????????????????????????????????????????????????? Hydrophobic, Hydroxypatite

Titanium Carbide?????????????????????????????????????????????????????????????? ?????? Teflon’s, PTFE, PFA, FEP, AND PVDF

Aluminum Titanium Nitride?????????????????????????????????????????????????? Liquid Based Peek, Pure Peek Powder

Amorphous Oxides????????????????????????????????????????????????????????????????? Dicronite, Parylene, MoS2

Chromium Nitrides?????????????????????????????????????????????????????? ??????????? Carbon Nanotubes/Diamond Particles??????

Biodegradable Protein & Flexible ???????????????????????????????????????? Biodegradable Silicon Photovoltaics?????????????????????????? ?????????????????

Proprietary or Patentable Coatings??????????????????????? ???????

?Topology, R&D, and Commercialization

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