A Look Back on 4 Years of Gauss Labs

August 12th marked Gauss Labs’s 4th anniversary. As we celebrate our four-year journey, our remarkable growth and achievements highlight our commitment to our mission: to build technology to transform the industry for positive impact on the world.

Gauss Labs was founded in 2020, born out of a vision to revolutionize manufacturing with AI. We started with what seemed to be the most challenging problem in semiconductor manufacturing, the virtual metrology. It indeed was challenging as expected, or more than expected. But, we were able to successfully launch Panoptes VM 1.0 in about three years in late 2022.

It was all thanks to the extremely talented team who joined Gauss Labs with a passion for state-of-the-art industrial AI solutions. In 2020, Gauss Labs was just a small team of 8 people, but now in four years, it has grown to over 60, reflecting its exponential growth even faster than Moore’s law itself and the increasing demand for AI-driven solutions in the fabrication space.

Gauss Labs remains committed to advancing the industry through the latest update of Panoptes VM. Newly released, Panoptes VM 2.0 addresses domain-specific needs, such as multi-step modeling that accounts for the complexities of etching processes and incorporates data from prior manufacturing steps to enhance accuracy of predictive models. For us, innovation never rests, and meeting the evolving needs of customers is essential to driving profound change and solidify our position as a global leader in industrial AI. Here are the key features newly added:

• Multi-step Modeling: Panoptes VM 2.0 improves prediction accuracy by allowing models to use data from both current and previous steps, particularly benefiting the complex, dependent processes like etching.
• Operation-group Modeling: Effective model training requires a certain amount of data, with more data generally being better. When metrology data is scarce, the aggregated modeling function helps; in addition to product-group modeling, Panoptes VM 2.0 can now group data from similar operations as well to enhance modeling accuracy.
• Automatic Model Selection: Panoptes VM 2.0 supports multi-algorithm architecture and automatically selects the best performing model based on data characteristics, improving the accuracy and usability of VM.

For more details, read the official Panoptes VM 2.0 press release.

As Gauss Labs continues to innovate and refine our solutions for manufacturing, we are focused on driving efficiency with industrial AI in semiconductor manufacturing and beyond. We're excited about the future developments in our product line, including further enhancements and addition to Panoptes. We invite anyone interested to reach out at [email protected] for more information!