The Impedans Newsletter - June 2024
Impedans Ltd
Intelligent sensing platforms for radio-frequency (RF) and plasma process monitoring. #PlasmaDiagnostics #RFPlasma
In this edition of the Impedans newsletter, discover the latest trends in 3D NAND technology, gain insights into the critical role of plasma deposition processes in semiconductor manufacturing, and understand how Impedans Semion facilitates ion energy measurements on biased substrates.
Industry News:?Future Trends in Semiconductor Manufacturing: 3D NAND and Beyond
The future of semiconductor manufacturing is marked by groundbreaking innovations such as 3D NAND, advanced lithography, heterogeneous integration, and emerging computing paradigms like quantum and neuromorphic computing. These advancements promise higher performance, greater efficiency, and new capabilities, driving the next wave of technological progress across various industries.
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Blog: Unlocking Advanced Manufacturing: Plasma-Assisted Deposition Process?
Plasma-assisted deposition is a cornerstone of modern manufacturing, enabling the creation of advanced materials with exceptional properties. Its versatility, precision, and ability to operate at lower temperatures make it an invaluable tool across various industries. This blog delves into the intricacies of plasma-assisted deposition, exploring its principles, advantages, challenges and Impedans technology to create high-quality thin films and coatings for a wide range of applications.?
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Video: IEDF measurements on biased substrates with Impedans Semion RFEA
Control of ion energies and ion flux bombarding over a surface is very important in many plasma processes such as etching and depositions. Biasing the substrate with a lower frequency is very popular technique to control the ion energies in plasma. In this video, learn how the biasing voltage impacts the ion energies using the Impedans Semion RFEA.?
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Appnote: Impedans Langmuir Probe used for the etching process of magnetic tunnel junction materials in random access memory devices
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A recent publication in Journal of Vacuum Science and Technology A highlights the application of Impedans Langmuir probe in the etching of a magnetic tunnel junction layer of magnetic random-access memory (MRAM). The Langmuir Probe measurements played a key role in understanding the function of plasma species to improve the etch rate and selectivity at different RF bias conditions.
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Event: Semicon West 2024
Visit us at Booth 5239, North Hall to:
Don’t miss this opportunity to connect with our plasma experts Angus McCarter, Steve Hertog, and Aodh O'Connor to discover how Impedans can help you achieve precision and efficiency in your plasma processes.
Event: ISSP 2024
Optimizing sputtering and thin film processes for seamless R&D to industrial transition has always been a major challenge. Achieving successful process development and transfer across various tools necessitates a comprehensive understanding of various surface plasma interactions.
Join?Dr. Thomas Gilmore?as he will discuss the process challenges and innovative solutions offered by Impedans Semion and Quantum RFEA range for thin film deposition tools.
Contact Us:
If you would like to learn more about plasma measurement or for any other inquiries you can contact us at www.impedans.com or email at [email protected].