Impedans July Newsletter

In this edition of the Impedans newsletter, we delve into the latest innovations in sub-nanometer transistor development and examine how RF power influences plasma technology, including the crucial role of Impedans diagnostics. Additionally, we feature a video spotlight on the Impedans Langmuir Probe software, which highlights key distinctions in I-V curves obtained with various types of tips.

Industry News: Scientist discover a way to grow sub-nanometer sized transistors

A research team from the Institute for Basic Science (IBS) has implemented a new method to achieve epitaxial growth of 1D metallic materials with a width of less than 1 nm. They used the 1D metals as a gate electrode of the ultra-miniaturized transistor. This process helped them create a new design for 2D semiconductor logic circuits.

To read more click here

Blog: Radio Frequency Power - Driving Modern Plasma Technologies

RF power technology is at the heart of plasma applications, providing the precision, versatility, and efficiency needed for a wide range of industries from semiconductor manufacturing to environmental applications. By incorporating Impedans RF diagnostics, plasma assisted industries can harness the full potential of this powerful technology to create high-quality products for a wide range of applications.?

To read more click here

Video: Langmuir Probe I-V characteristics with different types of tips

Impedans provides various tip styles for its Langmuir Probes, which can be easily replaced to suit different plasma pressure and density applications. The I-V characteristic is crucial for diagnosing plasma parameters with a Langmuir Probe. This video shows how three different tip styles—single, double, and planar—affect the shape of the I-V characteristics.

To watch the video click here

Appnote: Impedans Octiv VI Probe application for surface wettability control and fluorination of amorphous carbon films

A recent publication in Journal of Applied Surface Science highlights the application of Impedans Octiv Poly VI probe in fluorination of amorphous carbon films. Octiv measurements played a key role in identifying the bias power range for improved wettability of fluorinated amorphous carbon films.

To read a summary of this paper click here

Webinar: Analysing HiPIMS - Introduction and Findings using Impedans Diagnostics

High Power Impulse Magnetron Sputtering (HiPIMS) offers unparalleled control over thin film properties and deposition rates. However, to fully harness the potential of HiPIMS, it is crucial to understand the underlying plasma dynamics that drive these processes.?Through a series of case studies and recent findings, we will illustrate how Impedans diagnostics contribute to optimizing deposition processes, improving film quality, and advancing our understanding of plasma interactions.

To register for this webinar click here

Event: ALD/ALE 2024

Atomic layer deposition and etching (ALD/ALE) are important processes for creating nano scale patterns as they can deposit or remove layers with atomic-scale precision, excellent uniformity, and atomic level surface roughness. However, as structures become more spatially demanding and device dimensions shrink, the necessity for controllable and optimized plasma processes intensifies.

Join Dr. Angus McCarter as he will discuss the process challenges, innovative solutions, and successful case studies, shedding light on the transformative potential of RFEA technology in advancing plasma-assisted processes.

Event: Hakone XVIII

Atmospheric-pressure plasma jets (APPJ) are used in a variety of materials processes. The experimental characterization of these jets with Langmuir has been challenging because of their low density and small plasma sizes.

Join Mr. Daniel Simpson to learn about the experimental characterization of a He APPJ plasma using a Langmuir double probe technique to determine the electron temperature and density. Additionally, a theoretical model has been developed to determine the plasma parameters of the jet, which aligns well with the experimental results.

If you would like more information about our plasma measurement products and how we can solve your plasma measurement challenges contact us at [email protected]