Impedans Insights: November 2024 Newsletter

Advance in 4-inch heterostructure fabrication enhances AI semiconductors

For the first time globally, a 4-inch heterostructure fabrication technology using plasma-enhanced?chemical vapor deposition?(PECVD) has been developed. This breakthrough enables the production of low-power, high-performance semiconductors, surpassing the capabilities of traditional silicon-based technology.

This breakthrough allows for the development of a 3D integrated structure, which significantly reduces?power loss?and?heat dissipation, leading to enhanced performance and?energy efficiency—key factors for low-power, high-performance AI semiconductors.

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Tailored Waveform Applications in Plasma - Unlocking New Frontiers in Plasma Technology

Precise control of ion energy, plasma density, and uniformity is essential in plasma processing. Tailored waveform DC bias is a novel technique that enhances this precision by modulating the DC bias voltage with custom waveforms. This allows for greater control over plasma parameters, improving process efficiency, material properties, and overall process performance. This blog delves into the concept of tailored waveforms for DC bias, their operation in plasma tools, and their transformative impact on plasma-based processes.

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Impedans Langmuir Probe Automatic Cleaning Function

In low-temperature plasmas, surface contamination on the Langmuir probe can be problematic, potentially reducing the current it collects. To address this, a heating mechanism or a glow discharge plasma can be employed to clean the probe and ensure accurate measurements. The Impedans Langmuir Probe is equipped with an automatic cleaning function that applies a positive voltage to the probe tip, causing it to glow white and vaporize any impurities. The video shows a live demo of probe cleaning in a CCP chamber.?

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Impedans Semion RFEA and Octiv VI Probe used to measure Ion Properties & Electrical Characteristics of a 60 MHz Magnetron Discharge

A recent publication in Plasma Science and Technology discusses the use of Impedans Semion RFEA and Octiv Suite VI probes in very high frequency magnetron sputtering tools. Semion measurements were crucial in determining the optimal power range for depositing Silicon films with improved crystal structure and higher growth rates. Additionally, Octiv VI Probe measurements provided valuable electrical discharge characteristics, enhancing the understanding of electron and ion behavior within the plasma.?

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Utilising in-situ Plasma Diagnostics for Enhanced Deposition Control

Join us for our last webinar of the year with Dr. Thomas Gilmore and Dr. Caroline Hain. This webinar will provide an in-depth overview of deposition processes, focusing on how plasma conditions directly impact the properties of thin films. By understanding and controlling plasma parameters using in-situ diagnostics such as Langmuir Probe and QCM, tailored films can be fabricated to meet specific performance requirements. Case studies will cover a range of materials, including metallic alloys, diamond-like carbon and nitrides illustrating how these techniques can be applied to control and tune film properties in diverse applications.

To register click here

To know more about plasma measurement and for any inquiries email us at [email protected]