Impedans Insights: December 2024 Newsletter

This edition features a recent advancement in GeV-energy laser plasma experiments, a case study using the Octiv VI probe to reduce wafer scrappage in semiconductor manufacturing, and a video showcasing RFEA sensors of different signal sensitivities for ion energy measurements in plasmas. It also highlights an application note on optimizing magnetized PEALD thin-film deposition using the Impedans Langmuir Probe and Semion RFEA diagnostics tools.

Industry News:?Milestone 10-GeV experiment shines light on laser-plasma interactions

Scientists have used a pair of lasers and a supersonic sheet of gas to accelerate electrons to high energies in less than a foot. The development marks a major step forward in laser-plasma acceleration, a promising method for making compact, high-energy particle accelerators that could have applications in particle physics, medicine, and materials science.

To read more click here.

Customer Success Stories: Octiv’s 0.5 Angstrom precision ensures wafer bonding perfection and reduced downtime with real-time process optimization

This case study demonstrates how the Impedans Octiv VI Probe provides? real-time feedback eliminates re-qualification, reduces downtime, and minimizes scrappage costs, enhancing throughput and process accuracy in semiconductor manufacturing.

To read more click here.

Video: Semion RFEA Button Probes

The Semion Retarding Field Energy Analyzer (RFEA) system provides real-time measurement of critical process parameters, including ion flux, ion energy distribution, and deposition rate, directly at the surface using an imitation substrate (holder plate) equipped with integrated sensors (Button Probes). These Button Probes feature four grids, each with a 54% transmission rate. A variety of interchangeable Button Probes are available, offering different signal sensitivities to accommodate a broad range of plasma ion current densities. Additionally, they are offered in various materials to meet the requirements of different plasma processes. Watch the video to learn more!

To read more click here.

Appnote: Optimization of Magnetized PEALD Processes with Impedans Langmuir Probe and Semion RFEA

A recent study published in the Journal of Nanotechnology demonstrated the application of Impedans’ Langmuir probe and Semion RFEA in the deposition of silicon nitride (SiNx) films using the plasma-enhanced atomic layer deposition (PEALD) process. Langmuir probe and Semion RFEA measurements were instrumental in understanding the role of plasma species under varying experimental conditions, leading to improvements in deposition rates.

To read more click here.

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