CMP - Terahertz Nanometrology: Multispectral Imaging of Nanoparticles & Nanoclusters in Slurry Suspensions - TeraSpectra
John Mahoney
C4Technology, LLC President | Semiconductor & Electronics OEM Technical Sales Applications & Disruptive Innovation Technologies
A common problem in Semiconductor Manufacturing is to measure the size of the CMP Slurry Nanoparticles while they are still in the suspension. Many existing methods require extensive sample optimization, especially for new types of nanoparticles and solvent combinations. Applied Research & Photonics, Inc. (ARP) have overcome these challenges utilizing ARP's TeraSpectra Continous Wave, 30THz 3D Imaging & Spectroscopy Nanoscanning Systems.
John Mahoney Senior Consultant Applied Research & Photonics, Inc.
Contact John Mahoney to request a copy of the White Paper.