Canon delivers nanoimprint lithography system to the Texas Institute for Electronics

#Canon Inc. announced that it will ship its most advanced #lithography platform, the FPA-1200NZ2C #nanoimprint lithography (#NIL) system for semiconductor manufacturing, to the Texas Institute for Electronics (#TIE), a Texas-based semiconductor consortium, on September 26, 2024. https://global.canon/en/news/2024/20240926.html

FPA-1200NZ2C will be used at TIE for the research and development of advanced semiconductors and production of prototypes. We can see the brief analysis in the https://bits-chips.nl/article/canon-finds-first-customer-for-nanoimprint-tool/

#FPA1200NZ2C #nm #semiconductor