Trion Technology, Inc.

Since 1989, Trion Technology, Inc. has become a manufacturing leader in precision plasma etch, photoresist strip, and deposition systems specifically designed to meet the unique demand for the small-to-medium-run services required in the semiconductor, telecommunication, MEMS, and photonic industries worldwide. Capabilities include lithography, wafer bonding, plasma etching, stripping, deposition, sputtering, evaporation, thermal oxidation, and metrology. For more information, visit https://triontech.com

网站

https://triontech.com

Trion Technology, Inc.的外部链接

所属行业

半导体制造业

规模

11-50 人

总部

Clearwater，Florida

类型

私人持股

创立

1989

领域

Reactive Ion Etch、Plasma Etch、Plasma Deposition、Plasma Enhanced Chemical Vapor Deposition、PECVD、Compound Semiconductor、MEMS、Opto-Electronics、Failure Analysis、Manufacturing、Integrated Circuits、Fabricating Wafers、Inductively Coupled Plasma、GaN Etch、GaAs Etch、SiO2 Etch、Si3N4 Etch、SiO2 Deposition、Si3N4 Deposition、Photoresist Strip、Asher、Descum、RIE-ICP、Semiconductor、Wafer Processing Equipment、Plasma Cleaning Systems、Dry Etch Equipment、Thin Film Deposition、Photonics、Wafer Bonding、Sputter、Resist Removal、DRIE、PVD、HDCVD、ALD、Pilot Line Production和Research & Development