D2S, Inc.

D2S, Inc. CEO Aki Fujimura talks about #multibeam mask writers enabling a new solution, #PLDC (pixel-level dose correction), to improve uniformity and linearity for all #photomasks. https://lnkd.in/eYBhisuw

Aki Fujimura, CEO of D2S, Inc., interviews Jed Rankin of IBM and president of the #BACUS steering committee the past two years. Listen to Jed's views on the #photomask conference and community. Thanks for all your contributiones, Jed! https://lnkd.in/epA4dfat

eBeam Initiative announced the 2024 Luminaries Survey results today: 100 percent of survey respondents predict that mask revenues in 2024 will increase (74 percent) or stay the same (26 percent) compared to 2023.  We'll be celebrating the results at #SPIEphotomaskEUV during our annual event this evening! https://lnkd.in/ee3fJz_8

D2S, Inc., a supplier of #GPU-accelerated solutions for #semiconductor manufacturing, today announced that Bala Thumma, a semiconductor industry luminary and former senior executive at Synopsys, has joined the company as vice president of pixel-level dose correction (#PLDC). With more than 25 years of software, semiconductor manufacturing and electronic design automation (#EDA) experience, Bala will drive development and customer relations for D2S’ PLDC solution. https://lnkd.in/ezkzqMjS

D2S Chief Product Officer Leo Pang on why the #photomask world is moving to #curvilinear in part 1 of this two part series. Thanks Silicon Semiconductor and the eBeam Initiative! https://lnkd.in/esX23Tg9

Micron Technology and D2S, Inc. propose an equivalent CD spec for #curvilinear #photomasks...in a recent paper available through SPIE. Leo Pang Aki Fujimura Nagesh Shirali Grace Dai https://lnkd.in/erpG5V63

Well done to the European Mask and Lithography Conference organizers and presenters on a worthwhile event in June! Uwe Behringer Jo Finders Naoya Hayashi Bríd Connolly Hans Loeschner Ines Stolberg Andreas Erdmann Jan Hendrik Peters Thanks for the report, Asmus Hetzel

Another great eBeam Initiative interview by Aki Fujimura, CEO of D2S, Inc. talking with G Dan Hutcheson, Vice Chair of TechInsights. https://lnkd.in/ePPsKE4G

Impressions from the 19th Fraunhofer Fraunhofer IISB #Lithography #Simulation #Workshop in Behringersmuehle: Thank you to our keynote speaker Leo Pang (D2S), all speakers and attendees, who made it a memorable event. We enjoyed very interesting talks and discussions about #EUV, #Metasurfaces, #DeepLearning and many other topics. Thanks to SAOT - Erlangen Graduate School in Advanced Optical Technologies for sponsoring the event. We hope to see many of you at the 20th workshop in May 2025. The Fraunhofer IISB #Computational #Lithography and #Optics Group

New article on #gpu acceleration featuring D2S, Inc. CEO Aki Fujimura, saying "The prevailing method in #semiconductor mask making is largely based on the traditional Manhattan style, but there’s a consensus that a shift toward #curvilinear mask making is on the horizon. This transition is likely to necessitate the use of GPUs, given their superior processing power and capability to handle complex calculations. " https://lnkd.in/eFK5s6vs