D2S, Inc.

Aki Fujimura, CEO of D2S, Inc. “Improving #photomask uniformity is the easiest, cheapest way to improve wafer unformity.” Read about how #curvilinear #ILT with #PLDC does it.

150 members, colleagues, and industry luminaries gathered at the #eBeam Initiative lunch during #SPIElitho this week. Frank Abboud from Intel Corporation provided a comprehensive update on industry efforts to enable large format #photomasks (6X12) for supporting #highNA #EUV and achieving significant productivity gains for .33NA #EUV (>450wph). Following this, Aki Fujimura from D2S, Inc. discussed Tekscend Photomask Corp. and Micron Technology implementations of pixel-level dose correction #PLDC to enhance mask uniformity and linearity in 0 TAT across both Manhattan and #curvilinear mask shapes, noting it would work for large format masks as well. Stay tuned for video recordings of both presentations on www.ebeam.org by the end of March. Ed Sperling Katherine Derbyshire Mark LaPedus David Moreno Angie Kellen Leo Pang Bala Thumma Paris Spinelli Kent Nakagawa

D2S, Inc. CEO Aki Fujimura talks about #multibeam mask writers enabling a new solution, #PLDC (pixel-level dose correction), to improve uniformity and linearity for all #photomasks. https://lnkd.in/eYBhisuw

Aki Fujimura, CEO of D2S, Inc., interviews Jed Rankin of IBM and president of the #BACUS steering committee the past two years. Listen to Jed's views on the #photomask conference and community. Thanks for all your contributiones, Jed! https://lnkd.in/epA4dfat

eBeam Initiative announced the 2024 Luminaries Survey results today: 100 percent of survey respondents predict that mask revenues in 2024 will increase (74 percent) or stay the same (26 percent) compared to 2023.  We'll be celebrating the results at #SPIEphotomaskEUV during our annual event this evening! https://lnkd.in/ee3fJz_8

D2S, Inc., a supplier of #GPU-accelerated solutions for #semiconductor manufacturing, today announced that Bala Thumma, a semiconductor industry luminary and former senior executive at Synopsys, has joined the company as vice president of pixel-level dose correction (#PLDC). With more than 25 years of software, semiconductor manufacturing and electronic design automation (#EDA) experience, Bala will drive development and customer relations for D2S’ PLDC solution. https://lnkd.in/ezkzqMjS

D2S Chief Product Officer Leo Pang on why the #photomask world is moving to #curvilinear in part 1 of this two part series. Thanks Silicon Semiconductor and the eBeam Initiative! https://lnkd.in/esX23Tg9

Micron Technology and D2S, Inc. propose an equivalent CD spec for #curvilinear #photomasks...in a recent paper available through SPIE. Leo Pang Aki Fujimura Nagesh Shirali Grace Dai https://lnkd.in/erpG5V63

Well done to the European Mask and Lithography Conference organizers and presenters on a worthwhile event in June! Uwe Behringer Jo Finders Naoya Hayashi Bríd Connolly Hans Loeschner Ines Stolberg Andreas Erdmann Jan Hendrik Peters Thanks for the report, Asmus Hetzel

Another great eBeam Initiative interview by Aki Fujimura, CEO of D2S, Inc. talking with G Dan Hutcheson, Vice Chair of TechInsights. https://lnkd.in/ePPsKE4G